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URL: https://plasma.oxinst.com/products/atomic-layer-deposition/atomfab
Proper Citation: Oxford: Atomfab ALD Plasma Technology (RRID:SCR_020350)
Description: Uses remote source specifically designed for atomic scale processing. Has low damage for sensitive substrates, fast cycle times and reliablity with uniform plasma exposure and film deposition, short plasma times, 250ms, short strike time, 80ms, for high throughput, and reproducible strike time and low reflected power for high yield.
Resource Type: instrument resource
Keywords: Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit,
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