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URL: https://plasma.oxinst.com/products/icp-etching/plasmapro-100-polaris
Proper Citation: Oxford: PlasmaPro 100 Polaris Plasma Technology (RRID:SCR_020359)
Description: PlasmaPro 100 Polaris single wafer etch system offers solutions to produce etch results needed to maintain competitive edge, with experience of etching materials such as GaN, SiC and Sapphire.
Resource Type: instrument resource
Keywords: Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit,
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