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URL: https://plasma.oxinst.com/products/pecvd/plasmapro-800-pecvd
Proper Citation: Oxford: PlasmaPro 800 PECVD Plasma Technology (RRID:SCR_020379)
Description: PlasmaPro 800 offers solution for Plasma Enhanced Chemical Vapour Deposition processes on large wafer batches and 300mm wafers, in compact footprint, open loading system. Large wafer platen allows for production scale batch processing and 300mm wafer handling.
Resource Type: instrument resource
Keywords: Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit,
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