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Swinging bucket benchtop centrifuge. Eppendorf 5920 R refrigerated centrifuge.
Proper citation: Eppendorf: 5920R centrifuge (RRID:SCR_018092) Copy
https://precisionary.com/wp-content/uploads/2018/06/Compresstome-VF-700-0Z-User-Manual_FINAL.pdf
Vibrotome by Precisionary Instruments designed for cutting fixed tissue slices for histology studies. Offers two point stabilization of blade holder to eliminate unwanted chatter marks on surfaces of tissue slice. Fully automated to section fixed tissues with thickness range of 4 um to 2000 um with adjustable precision of 1 um.
Proper citation: Precisionary: Compresstome VF-700 (RRID:SCR_018409) Copy
https://www.olympus-lifescience.com/en/microscopes/virtual/vs120/
VS120 Virtual Slide Microscope. Part of slide loader system for manually loading standard slides by Olympus.
Proper citation: Olympus: VS120 microscope (RRID:SCR_018411) Copy
https://glycocheck.com/health-score-technology/
Microvascular health measurement system that measures endothelial glycocalyx layer of vessels by MicroVascular Health Solutions. Software automatically identifies measurable micro vessels, below 30 µm thickness, during acquisition by contrast between RBC and background. After acquisition, software undergoes series of quality checks to measure vascular segments that are of good quality. Video microscope is placed under tongue, showing live movement of red blood cells as they travel through micro vessels.
Proper citation: GlycoCalyx: GlycoCheck (RRID:SCR_018254) Copy
https://plasma.oxinst.com/products/ale/plasmapro-100-ale
PlasmaPro 100 ALE delivers precise process control to create and manipulate thinner layers through specialised hardware including precise control of gas dose, repeatability of low power RF delivery, and switching enabled by fast PLC.
Proper citation: Oxford: PlasmaPro 100 ALE Plasma Technology (RRID:SCR_020372) Copy
https://afm.oxinst.com/products/mfp-3d-afm-systems/mfp-3d-origin-afm
Features Asylum Research performance and quality and offers high resolution imaging, supports large samples, most imaging modes, and many accessories.
Proper citation: Oxford: MFP-3D Origin AFM (RRID:SCR_020369) Copy
http://www.teledynecetac.com/products/laser-ablation/analyte-excite
Laser ablation system that offers excimer technology at 193 nm with all the analytical capabilities you require, and a price you can afford. The Excite delivers finely controlled, homogenizer-flat ablations with high sensitivity and split second response. Fire-on-the-fly lasing that is synchronized to the stage motion, combined with fast washout ablation cells, make precision depth profiling of spots, lines and areas possible and enables high spatial resolution elemental mapping. The Excite is equipped with a high definition, color GigE camera on a high magnification, optical zoom, video-microscope capable of resolving 2 �m features. Transmitted, reflective and ring illumination, cross polarizers plus software selectable camera settings give the user enhanced viewing capabilities. The combination of ultra-short pulse length and 193 nm wavelength is unsurpassed in coupling efficiency. The Excite ablates all materials, from opaque to highly transparent, including delicate powders, hard quartz and resilient carbonates with depth penetration in the tens of nanometers per shot. The beam energy profile is homogenized to ensure uniform ablations across the entire range of spot sizes and on a wide range of materials.
Proper citation: Teledyne: Photon Machines Analyte Excite Laser Ablation Source Analyte (RRID:SCR_020402) Copy
https://sagescience.com/products/pippin-prep/
Facilitates library construction system for NGS platforms, and is recommended by Illumina and Ion Torrent for certain workflows. The platform features the ability to collect narrow and even fragment distributions, as well as the flexibility to collect wide ranges of fragments with minimal effort. Target sizes or ranges of sizes are entered in software, and fractions are collected in buffer. Up to 5 samples per gel cassette may be run, with no possibility of cross contamination.
Proper citation: Sage Science: Pippin Prep (RRID:SCR_020403) Copy
https://afm.oxinst.com/products/mfp-3d-afm-systems/mfp-3d-origin-plus-afm
Features same core performance as MFP 3D Origin but includes support for complete range of innovative MFP 3D accessories.
Proper citation: Oxford: MFP-3D Origin+ AFM (RRID:SCR_020367) Copy
https://nanoscience.oxinst.com/proteox
Self supporting Secondary Insert that enhances adaptability, enabling rapid exchange of full experimental setups for multi user, multi experiment system. Upgradeable Secondary Inserts are cross compatible and transferrable between ProteoxTM family systems. Has large experimental volume and abundant line of sight access.
Proper citation: Oxford: Proteox Dilution Refrigerator (RRID:SCR_020383) Copy
https://plasma.oxinst.com/products/cvd/plasmapro-100-nano
Chemical Vapour Deposition and PECVD tools for growth of 1D and 2D nanomaterials and heterostructures. PlasmaPro 100 Nano delivers performance growth of nanomaterials with in situ catalyst activation and process control, with flexible temperatures up to 1,200 degrees C.
Proper citation: Oxford: PlasmaPro 100 Nano Plasma Technology (RRID:SCR_020384) Copy
https://plasma.oxinst.com/products/rie/80rie
PlasmaPro 80 reactive ion etch is compact, small footprint system offering etch and deposition solutions with open loading. Open load design allows fast wafer loading and unloading, ideal for research, prototyping and low volume production. It enables high performance processes using optimised electrode cooling and substrate temperature control.
Proper citation: Oxford: PlasmaPro 80 RIE Plasma Technology (RRID:SCR_020381) Copy
https://nanoscience.oxinst.com/products/cryofree-magnets/spectromagpt
Split pair, horizontal field magneto optical Cryofree superconducting magnet system. It provides optical access to sample in variable magnetic field and low temperature environment.
Proper citation: Oxford: SpectromagPT Superconducting Magnet System (RRID:SCR_020382) Copy
https://plasma.oxinst.com/products/pecvd/plasmapro-80-pecvd
PlasmaPro 80 is compact, small footprint system offering etch and deposition solutions with open loading. Open load design allows fast wafer loading and unloading, ideal for research, prototyping and low volume production. It enables high performance processes using optimised electrode cooling and substrate temperature control.
Proper citation: Oxford: PlasmaPro 80 PECVD Plasma Technology (RRID:SCR_020380) Copy
https://plasma.oxinst.com/products/icpcvd/plasmapro-80-icpcvd
PlasmaPro 80 is compact, small footprint system offering etch and deposition solutions with open loading. Open load design allows fast wafer loading and unloading, ideal for research, prototyping and low volume production. It enables high performance processes using optimised electrode cooling and substrate temperature control.
Proper citation: Oxford: PlasmaPro 80 ICPCVD Plasma Technology (RRID:SCR_020378) Copy
https://plasma.oxinst.com/products/rie/plasmapro-100
PlasmaPro 100 RIE modules deliver anisotropic dry etching. Being compatible with all wafer sizes up to 200mm, it has rapid change between wafer size, uniformity, high throughput and high precision processes, in situ chamber cleaning and end pointing, and wide temperature range electrode, from 150 degrees C to 400 degrees C.
Proper citation: Oxford: PlasmaPro 100 RIE Plasma Technology (RRID:SCR_020376) Copy
https://plasma.oxinst.com/products/icp-etching/80icp
PlasmaPro 80 ICP is compact, small footprint system offering ICP etch solutions with open loading. Open load design allows fast wafer loading and unloading, ideal for research, prototyping and low volume production. It enables high performance processes using optimised electrode cooling and substrate temperature control.
Proper citation: Oxford: PlasmaPro 80 ICP Plasma Technology (RRID:SCR_020377) Copy
https://plasma.oxinst.com/products/ald/flexal
FlexAL systems provide newrange of flexibility and capability in engineering of nanoscale structures and devices by offering remote plasma atomic layer deposition processes and thermal ALD within single ALD systems.
Proper citation: Oxford: FlexAL ALD System Plasma Technology (RRID:SCR_020352) Copy
https://plasma.oxinst.com/products/atomic-layer-deposition/atomfab
Uses remote source specifically designed for atomic scale processing. Has low damage for sensitive substrates, fast cycle times and reliablity with uniform plasma exposure and film deposition, short plasma times, 250ms, short strike time, 80ms, for high throughput, and reproducible strike time and low reflected power for high yield.
Proper citation: Oxford: Atomfab ALD Plasma Technology (RRID:SCR_020350) Copy
https://nanoscience.oxinst.com/products/control-electronics/mercuryips
Magnet power supply system enables automated control of wide range of superconducting magnets, including NMR, high field, beamline and Vector Rotate magnet systems. MercuryiPS is bi polar and has high stability, four quadrant power supply with incorporated quench protection.
Proper citation: Oxford: MercuryiPS Power Supply System (RRID:SCR_020361) Copy
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