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SciCrunch Registry is a curated repository of scientific resources, with a focus on biomedical resources, including tools, databases, and core facilities - visit SciCrunch to register your resource.
| Resource Name | Proper Citation | Abbreviations | Resource Type |
Description |
Keywords | Resource Relationships | |||||||||||||
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Miltenyi: gentleMACS M Tubes Tubes Resource Report Resource Website 1+ mentions |
Miltenyi: gentleMACS M Tubes Tubes (RRID:SCR_020269) | instrument resource | Used in combination with gentleMACS Dissociators for automated tissue homogenization, in order to isolate biomolecules like mRNA or total RNA, or to extract proteins. | Miltenyi, Tubes, Instrument, Equipment, USEDit, | Commercially available | https://raw.githubusercontent.com/SciCrunch/RRID-Instruments/main/PDF/SCR_020269.pdf | Model_Number_gentleMACS_M | SCR_020269 | 2026-08-01 12:06:47 | 5 | |||||||||
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SelectScience: Nano CT scanner: Xradia VersaXRM-500 Resource Report Resource Website |
SelectScience: Nano CT scanner: Xradia VersaXRM-500 (RRID:SCR_020308) | instrument resource | VersaXRM-500 from Xradia VersaXRM family is the latest generation of 3D X-ray microscopy (XRM) solutions optimized for non-destructive micro tomography. The VersaXRM-500 advances industry and science with a versatile combination of world-leading resolution and contrast, sample flexibility and the large working distance required to address emerging research challenges. The system's source technology and high resolution detector provide unmatched sub-micron resolution, even for large samples. | Scanner, instrument, equipment, USEDit | Commercially available | https://raw.githubusercontent.com/SciCrunch/RRID-Instruments/main/PDF/SCR_020308.pdf | Model_Number_Versa XRM-500 | SCR_020308 | 2026-08-01 12:06:55 | 0 | |||||||||
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Oxford: PlasmaPro 100 ALE Plasma Technology Resource Report Resource Website |
Oxford: PlasmaPro 100 ALE Plasma Technology (RRID:SCR_020372) | instrument resource | PlasmaPro 100 ALE delivers precise process control to create and manipulate thinner layers through specialised hardware including precise control of gas dose, repeatability of low power RF delivery, and switching enabled by fast PLC. | Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_100_ALE | SCR_020372 | 2026-08-01 12:06:45 | 0 | ||||||||||
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Oxford: MFP-3D Origin AFM Resource Report Resource Website |
Oxford: MFP-3D Origin AFM (RRID:SCR_020369) | instrument resource | Features Asylum Research performance and quality and offers high resolution imaging, supports large samples, most imaging modes, and many accessories. | Oxford, Atomic Force Microscopy, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_Origin | SCR_020369 | 2026-08-01 12:06:56 | 0 | ||||||||||
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Teledyne: Photon Machines Analyte Excite Laser Ablation Source Analyte Resource Report Resource Website |
Teledyne: Photon Machines Analyte Excite Laser Ablation Source Analyte (RRID:SCR_020402) | instrument resource | Laser ablation system that offers excimer technology at 193 nm with all the analytical capabilities you require, and a price you can afford. The Excite delivers finely controlled, homogenizer-flat ablations with high sensitivity and split second response. Fire-on-the-fly lasing that is synchronized to the stage motion, combined with fast washout ablation cells, make precision depth profiling of spots, lines and areas possible and enables high spatial resolution elemental mapping. The Excite is equipped with a high definition, color GigE camera on a high magnification, optical zoom, video-microscope capable of resolving 2 �m features. Transmitted, reflective and ring illumination, cross polarizers plus software selectable camera settings give the user enhanced viewing capabilities. The combination of ultra-short pulse length and 193 nm wavelength is unsurpassed in coupling efficiency. The Excite ablates all materials, from opaque to highly transparent, including delicate powders, hard quartz and resilient carbonates with depth penetration in the tens of nanometers per shot. The beam energy profile is homogenized to ensure uniform ablations across the entire range of spot sizes and on a wide range of materials. | Laser ablation system, instrument, equipment, USEDit | Commercially available | Model_Number_Analyte | SCR_020402 | 2026-08-01 12:06:56 | 0 | ||||||||||
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Sage Science: Pippin Prep Resource Report Resource Website |
Sage Science: Pippin Prep (RRID:SCR_020403) | instrument resource | Facilitates library construction system for NGS platforms, and is recommended by Illumina and Ion Torrent for certain workflows. The platform features the ability to collect narrow and even fragment distributions, as well as the flexibility to collect wide ranges of fragments with minimal effort. Target sizes or ranges of sizes are entered in software, and fractions are collected in buffer. Up to 5 samples per gel cassette may be run, with no possibility of cross contamination. | Library construction, NGS platform, instrument, equipment, USEDit | Commercially available | Model_Number_Pippin Prep | SCR_020403 | 2026-08-01 12:06:46 | 0 | ||||||||||
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Oxford: MFP-3D Origin+ AFM Resource Report Resource Website |
Oxford: MFP-3D Origin+ AFM (RRID:SCR_020367) | instrument resource | Features same core performance as MFP 3D Origin but includes support for complete range of innovative MFP 3D accessories. | Oxford, Atomic Force Microscopy, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_Origin_plus | SCR_020367 | 2026-08-01 12:06:49 | 0 | ||||||||||
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Oxford: Proteox Dilution Refrigerator Resource Report Resource Website |
Oxford: Proteox Dilution Refrigerator (RRID:SCR_020383) | instrument resource | Self supporting Secondary Insert that enhances adaptability, enabling rapid exchange of full experimental setups for multi user, multi experiment system. Upgradeable Secondary Inserts are cross compatible and transferrable between ProteoxTM family systems. Has large experimental volume and abundant line of sight access. | Oxford, Nanoscience, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_Proteox | SCR_020383 | 2026-08-01 12:06:49 | 0 | ||||||||||
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Oxford: PlasmaPro 100 Nano Plasma Technology Resource Report Resource Website |
Oxford: PlasmaPro 100 Nano Plasma Technology (RRID:SCR_020384) | instrument resource | Chemical Vapour Deposition and PECVD tools for growth of 1D and 2D nanomaterials and heterostructures. PlasmaPro 100 Nano delivers performance growth of nanomaterials with in situ catalyst activation and process control, with flexible temperatures up to 1,200 degrees C. | Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_100_Nano | SCR_020384 | 2026-08-01 12:06:56 | 0 | ||||||||||
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Oxford: PlasmaPro 80 RIE Plasma Technology Resource Report Resource Website |
Oxford: PlasmaPro 80 RIE Plasma Technology (RRID:SCR_020381) | instrument resource | PlasmaPro 80 reactive ion etch is compact, small footprint system offering etch and deposition solutions with open loading. Open load design allows fast wafer loading and unloading, ideal for research, prototyping and low volume production. It enables high performance processes using optimised electrode cooling and substrate temperature control. | Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_80_RIE | SCR_020381 | 2026-08-01 12:06:46 | 0 | ||||||||||
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Oxford: SpectromagPT Superconducting Magnet System Resource Report Resource Website |
Oxford: SpectromagPT Superconducting Magnet System (RRID:SCR_020382) | instrument resource | Split pair, horizontal field magneto optical Cryofree superconducting magnet system. It provides optical access to sample in variable magnetic field and low temperature environment. | Oxford, Nanoscience, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_SpectromagPT | SCR_020382 | 2026-08-01 12:06:56 | 0 | ||||||||||
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Oxford: PlasmaPro 80 PECVD Plasma Technology Resource Report Resource Website |
Oxford: PlasmaPro 80 PECVD Plasma Technology (RRID:SCR_020380) | instrument resource | PlasmaPro 80 is compact, small footprint system offering etch and deposition solutions with open loading. Open load design allows fast wafer loading and unloading, ideal for research, prototyping and low volume production. It enables high performance processes using optimised electrode cooling and substrate temperature control. | Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_80_PECVD | SCR_020380 | 2026-08-01 12:06:49 | 0 | ||||||||||
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Oxford: PlasmaPro 80 ICPCVD Plasma Technology Resource Report Resource Website |
Oxford: PlasmaPro 80 ICPCVD Plasma Technology (RRID:SCR_020378) | instrument resource | PlasmaPro 80 is compact, small footprint system offering etch and deposition solutions with open loading. Open load design allows fast wafer loading and unloading, ideal for research, prototyping and low volume production. It enables high performance processes using optimised electrode cooling and substrate temperature control. | Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_80_ICPCVD | SCR_020378 | 2026-08-01 12:06:45 | 0 | ||||||||||
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Oxford: PlasmaPro 100 RIE Plasma Technology Resource Report Resource Website |
Oxford: PlasmaPro 100 RIE Plasma Technology (RRID:SCR_020376) | instrument resource | PlasmaPro 100 RIE modules deliver anisotropic dry etching. Being compatible with all wafer sizes up to 200mm, it has rapid change between wafer size, uniformity, high throughput and high precision processes, in situ chamber cleaning and end pointing, and wide temperature range electrode, from 150 degrees C to 400 degrees C. | Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_100_RIE | SCR_020376 | 2026-08-01 12:06:56 | 0 | ||||||||||
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Oxford: PlasmaPro 80 ICP Plasma Technology Resource Report Resource Website |
Oxford: PlasmaPro 80 ICP Plasma Technology (RRID:SCR_020377) | instrument resource | PlasmaPro 80 ICP is compact, small footprint system offering ICP etch solutions with open loading. Open load design allows fast wafer loading and unloading, ideal for research, prototyping and low volume production. It enables high performance processes using optimised electrode cooling and substrate temperature control. | Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_80_ICP | SCR_020377 | 2026-08-01 12:06:49 | 0 | ||||||||||
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Oxford: FlexAL ALD System Plasma Technology Resource Report Resource Website |
Oxford: FlexAL ALD System Plasma Technology (RRID:SCR_020352) | instrument resource | FlexAL systems provide newrange of flexibility and capability in engineering of nanoscale structures and devices by offering remote plasma atomic layer deposition processes and thermal ALD within single ALD systems. | Oxford, Plasma Tehnology, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_FlexAL | SCR_020352 | 2026-08-01 12:06:45 | 0 | ||||||||||
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Oxford: Atomfab ALD Plasma Technology Resource Report Resource Website |
Oxford: Atomfab ALD Plasma Technology (RRID:SCR_020350) | instrument resource | Uses remote source specifically designed for atomic scale processing. Has low damage for sensitive substrates, fast cycle times and reliablity with uniform plasma exposure and film deposition, short plasma times, 250ms, short strike time, 80ms, for high throughput, and reproducible strike time and low reflected power for high yield. | Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_Atomfab | SCR_020350 | 2026-08-01 12:06:48 | 0 | ||||||||||
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Oxford: MercuryiPS Power Supply System Resource Report Resource Website |
Oxford: MercuryiPS Power Supply System (RRID:SCR_020361) | instrument resource | Magnet power supply system enables automated control of wide range of superconducting magnets, including NMR, high field, beamline and Vector Rotate magnet systems. MercuryiPS is bi polar and has high stability, four quadrant power supply with incorporated quench protection. | Oxford, Nanoscience, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_MercuryiPS | SCR_020361 | 2026-08-01 12:06:56 | 0 | ||||||||||
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Oxford: Ionfab 300 IBD Plasma Technology Resource Report Resource Website |
Oxford: Ionfab 300 IBD Plasma Technology (RRID:SCR_020362) | instrument resource | Ion beam deposition products produce deposited films with high quality, dense and smooth surfaces. Ion beam technology provides approach to etch and deposition by offering single tool and maximising system utilisation, which includes open load, single substrate load lock, and cassette to cassette. | Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_Ionfab_300_IBD | SCR_020362 | 2026-08-01 12:06:45 | 0 | ||||||||||
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Oxford: Jupiter XR AFM Resource Report Resource Website |
Oxford: Jupiter XR AFM (RRID:SCR_020360) | instrument resource | Large sample AFM that offers high speed imaging and extended range in single scanner. Jupiter provides complete 200 mm sample access and delivers resolution, results, and versatility for academic research and industrial R and D laboratories. | Oxford, Atomic Force Microscopy, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_Jupiter_XR | SCR_020360 | 2026-08-01 12:06:48 | 0 |
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