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Offers advanced integrated solutions to streamline cell processing workflows from cell separation through cell culture to formulation of final product. Offers flexible platform for cell processing applications enabling magnetic separation of different cell types and customized cell processing protocols.
Proper citation: Miltenyi: Prodigy Cell Manufacturing Platform (RRID:SCR_020289) Copy
https://bio.as.uky.edu/sites/default/files/typhoon%208600%20specifications.pdf
Typhoon 8600 Variable Mode Imager unites storage phosphor autoradiography technology with fourcolour fluorescent labelling techniques for maximum data quality in a single, high-throughput system.
Proper citation: Molecular Devices: Molecular Dynamics 8600 Imager (RRID:SCR_020299) Copy
https://www.miltenyibiotec.com/US-en/products/gentlemacs-octo-dissociator-with-heaters.html
Benchtop instrument for fully automated and standardized tissue dissociation or homogenization of up to eight samples. Equipped with eight individual heating units and gentleMACS Programs.
Proper citation: Miltenyi: gentleMACS Octo Dissociator with Heaters Tissue Dissociator (RRID:SCR_020271) Copy
https://www.mesoscale.com/en/products/meso-quickplex-sq-120-ai0aa/
QuickPlex instrument is the newest multiplexing instrument from MSD, offering access to high-performance, electrochemiluminescence immunoassays. This compact system has been engineered for reliability, ease of use, and low cost of ownership. The combination of rapid read times and the ability to perform multiple, simultaneous tests on a single sample increases productivity, saves sample, and delivers results quickly. The QuickPlex has a wide menu of commercially available assay kits and a full line of components and reagents for developing your own assays.
Proper citation: MESO: QuickPlex SQ 120 (RRID:SCR_020304) Copy
A1R model incorporates a hybrid scanner system utilizing a high speed resonant galvanometer capable of acquisitions up to 240 frames per second. Both scanners can be used simultaneously for experiments requiring acquisition and photoactivation by concurrently scanning the specimen. This supports advanced research methods using photoactivation fluorescence proteins and facilitates high-speed, live-cell work with a huge array of new imaging strategies. A spectral imaging detector further enables the A1 and A1R models to obtain up to 32 discreet spectral bandwidths of data in one acquisition, with spectral unmixing capabilities. The total system is controlled through NIS-Elements C applications software, which also enables full control of the Nikon Ti-E research inverted microscope equipped with Nikon's Focus System (PFS), widefield CCD cameras and an array of hardware devices.
Proper citation: Nikon: A1R Confocal Laser Scanning Microscope (RRID:SCR_020317) Copy
https://www.malvernpanalytical.com/en/support/product-support/nanosight-range/nanosight-ns500
Malvern Panalytical NanoSight NS500 instrument provides an easy-to-use, reproducible platform for nanoparticle characterization. The NS500 provides detailed and analysis of the size distribution and concentration of all types of nanoparticles from 10nm to 2000nm in diameter, depending on the instrument configuration and sample type being analyzed. Single particle zeta potential measurements on the NS500 provide inherent high resolution zeta distributions which can be measured simultaneously with other NTA measurements parameters like size, particle concentration and can even operate whilst in fluorescence mode.
Proper citation: Malvern Panalytical: Nanosight NS500 Analyzer (RRID:SCR_020310) Copy
https://plasma.oxinst.com/products/pecvd/plasmapro-100-pecvd
PECVD process modules are designed to produce uniformity and high rate films, with control of film properties such as refractive index, stress, electrical characteristics and wet chemical etch rate.
Proper citation: Oxford: PlasmaPro 100 PECVD Plasma Technology (RRID:SCR_020374) Copy
https://plasma.oxinst.com/products/icpcvd/plasmapro-100-icpcvd
ICPCVD process module is designed to produce films at low growth temperatures, enabled through high density remote plasmas that achieves film quality with low substrate damage.
Proper citation: Oxford: PlasmaPro 100 ICPCVD Plasma Technolgy (RRID:SCR_020375) Copy
https://plasma.oxinst.com/products/dsie/plasmapro-100-estrelas
Platform is designed to give total flexibility for Deep Silicon Etch applications. Serves diverse set of process requirements across Micro Electro Mechanical Systems and Advanced Packaging and Nanotechnology markets.
Proper citation: Oxford: PlasmaPro 100 Estrelas Plasma Technology (RRID:SCR_020373) Copy
https://nano.oxinst.com/omniprobe-400
Ninth generation of nanomanipulator, OmniProbe 400 uses piezo actuation for nanoscale positioning. Nanomanipulator with high resolution and high throughput applications.
Proper citation: Oxford: OmniProbe 400 Electron Microscope (RRID:SCR_020370) Copy
https://plasma.oxinst.com/products/icp-etching/plasmapro-100-icp
PlasmaPro 100 Cobra ICP utilises high density plasma to achieve etching and deposition rates. Process modules offer uniformity, high throughput, high precision and low damage processes for wafer sizes up to 200mm.
Proper citation: Oxford: PlasmaPro 100 Cobra Plasma Technolgy (RRID:SCR_020371) Copy
https://nanoscience.oxinst.com/products/measurement-systems/nanonis-tramea
Measurement system used for quantum transport measurements. In conjunction with cryogenic research tools, it offers multi channel measurements to for quantum technologies.
Proper citation: Oxford: Nanonis Tramea Measurement System (RRID:SCR_020368) Copy
https://afm.oxinst.com/products/mfp-3d-afm-systems/mfp-3d-bio-afm
Integrates AFM and optical microscopy for bioscience research. Bio AFM that uses AFM imaging resolution, force measurement performance, and application versatility while integrating optical techniques.
Proper citation: Oxford: MFP-3D-BIO AFM (RRID:SCR_020366) Copy
https://nanoscience.oxinst.com/products/cryofree-magnets/teslatronpt
Integrated Cryofree® superconducting magnet system with variable temperature inserts. Has standard magnetic fields up to 14 T in compact geometry, integrated variable temperature insert providing sample temperatures between 1.5 K and 300 K, and range of high performance sample rods with height adjustment and rotation options.
Proper citation: Oxford: TeslatronPT Superconducting Magnet System (RRID:SCR_020385) Copy
https://nanoscience.oxinst.com/products/cryofree-dilution-refrigerators/tritonxl
TritonXL is used for research applications where sample temperatures below 5 mK is required, for integrating larger numbers of signal lines or very high magnetic fields. Has two integrated 1.5 W pulse tube coolers, decoupled with flexible braids and bellows to minimize vibrations.
Proper citation: Oxford: TritonXL Dilution Refrigerator (RRID:SCR_020386) Copy
https://plasma.oxinst.com/products/pecvd/plasmapro-800-pecvd
PlasmaPro 800 offers solution for Plasma Enhanced Chemical Vapour Deposition processes on large wafer batches and 300mm wafers, in compact footprint, open loading system. Large wafer platen allows for production scale batch processing and 300mm wafer handling.
Proper citation: Oxford: PlasmaPro 800 PECVD Plasma Technology (RRID:SCR_020379) Copy
https://afm.oxinst.com/products/cypher-afm-systems/cypher-es-polymer-edition-afm
Configuration of Cypher ES AFM designed for polymer science research, comes standard with blueDrive photothermal excitation, three techniques from NanoMechPro toolbox for nanomechanical characterization, and high temperature polymer heater.
Proper citation: Oxford: Cypher ES Polymer Edition AFM (RRID:SCR_020353) Copy
https://afm.oxinst.com/products/cypher-afm-systems/cypher-es-environmental-afm
Asylum Research Cypher ES builds on performance of Cypher S and adds full environmental control features. Same resolution, speed and stability are maintained while operating in controlled gas or liquid environments, at temperatures from 0 to 250 degrees C.
Proper citation: Oxford: Cypher ES Environmental AFM (RRID:SCR_020351) Copy
https://nanoscience.oxinst.com/products/control-electronics/mercuryitc
Cryogenic environment controller that includes single channel 24 bit high resolution temperature measurement circuit, which supports all standard cryogenic sensors, like ruthenium oxide, cernox, silicon diodes, platinum, thermocouple and RhFe. With constant voltage mode, it enables accurate temperature measurement using negative temperature sensors down to below 250 mK.
Proper citation: Oxford: MercuryiTC Cryogenic Environment Controller (RRID:SCR_020363) Copy
https://plasma.oxinst.com/products/icp-etching/plasmapro-100-polaris
PlasmaPro 100 Polaris single wafer etch system offers solutions to produce etch results needed to maintain competitive edge, with experience of etching materials such as GaN, SiC and Sapphire.
Proper citation: Oxford: PlasmaPro 100 Polaris Plasma Technology (RRID:SCR_020359) Copy
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