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https://www.miltenyibiotec.com/US-en/products/skeletal-muscle-dissociation-kit-mouse-and-rat.html#130-098-305

Developed for generation of single cell suspensions from murine and rat skeletal muscle tissue. It is optimized for high yield of viable cells, for example satellite cells, while preserving important cell surface epitopes. Mature myotubes will be destroyed.

Proper citation: Miltenyi Mouse and Rat Skeletal Muscle Dissociation Kit (RRID:SCR_020281) Copy   

•   Source: SciCrunch Registry

https://www.miltenyibiotec.com/US-en/products/myelin-removal-beads-ii-human-mouse-rat.html#2x4-ml

Developed for specific removal of myelin debris from single cell suspensions. Myelin Removal Beads II work without determination of cell number or myelin debris cell ratio.

Proper citation: Miltenyi Human, Mouse, Rat Myelin Removal Beads II Removal Reagent (RRID:SCR_020279) Copy   

•   Source: SciCrunch Registry

https://www.miltenyibiotec.com/US-en/products/whole-skin-dissociation-kit-human.html#130-101-540

Enables generation of single cell suspensions from human skin tissue without separating dermis and epidermis. Kit has been developed for isolation of fibroblasts from diverse human skin biopsies as well as for phenotyping or enumeration of human skin cell populations by flow cytometry.

Proper citation: Miltenyi Human Whole Skin Dissociation Kit (RRID:SCR_020277) Copy   

•   Source: SciCrunch Registry

https://plasma.oxinst.com/products/ale/plasmapro-100-ale

PlasmaPro 100 ALE delivers precise process control to create and manipulate thinner layers through specialised hardware including precise control of gas dose, repeatability of low power RF delivery, and switching enabled by fast PLC.

Proper citation: Oxford PlasmaPro 100 ALE Plasma Technology (RRID:SCR_020372) Copy   

•   Source: SciCrunch Registry

https://afm.oxinst.com/products/mfp-3d-afm-systems/mfp-3d-origin-afm

Features Asylum Research performance and quality and offers high resolution imaging, supports large samples, most imaging modes, and many accessories.

Proper citation: Oxford MFP-3D Origin AFM (RRID:SCR_020369) Copy   

•   Source: SciCrunch Registry

http://www.teledynecetac.com/products/laser-ablation/analyte-excite

Laser ablation system that offers excimer technology at 193 nm with all the analytical capabilities you require, and a price you can afford. The Excite delivers finely controlled, homogenizer-flat ablations with high sensitivity and split second response. Fire-on-the-fly lasing that is synchronized to the stage motion, combined with fast washout ablation cells, make precision depth profiling of spots, lines and areas possible and enables high spatial resolution elemental mapping. The Excite is equipped with a high definition, color GigE camera on a high magnification, optical zoom, video-microscope capable of resolving 2 �m features. Transmitted, reflective and ring illumination, cross polarizers plus software selectable camera settings give the user enhanced viewing capabilities. The combination of ultra-short pulse length and 193 nm wavelength is unsurpassed in coupling efficiency. The Excite ablates all materials, from opaque to highly transparent, including delicate powders, hard quartz and resilient carbonates with depth penetration in the tens of nanometers per shot. The beam energy profile is homogenized to ensure uniform ablations across the entire range of spot sizes and on a wide range of materials.

Proper citation: Photon Machines Analyte Excite Laser Ablation Source Analyte (RRID:SCR_020402) Copy   

•   Source: SciCrunch Registry

https://sagescience.com/products/pippin-prep/

Facilitates library construction system for NGS platforms, and is recommended by Illumina and Ion Torrent for certain workflows. The platform features the ability to collect narrow and even fragment distributions, as well as the flexibility to collect wide ranges of fragments with minimal effort. Target sizes or ranges of sizes are entered in software, and fractions are collected in buffer. Up to 5 samples per gel cassette may be run, with no possibility of cross contamination.

Proper citation: Pippin Prep (RRID:SCR_020403) Copy   

•   Source: SciCrunch Registry

https://afm.oxinst.com/products/mfp-3d-afm-systems/mfp-3d-origin-plus-afm

Features same core performance as MFP 3D Origin but includes support for complete range of innovative MFP 3D accessories.

Proper citation: Oxford MFP-3D Origin+ AFM (RRID:SCR_020367) Copy   

•   Source: SciCrunch Registry

https://nanoscience.oxinst.com/proteox

Self supporting Secondary Insert that enhances adaptability, enabling rapid exchange of full experimental setups for multi user, multi experiment system. Upgradeable Secondary Inserts are cross compatible and transferrable between ProteoxTM family systems. Has large experimental volume and abundant line of sight access.

Proper citation: Oxford Proteox Dilution Refrigerator (RRID:SCR_020383) Copy   

•   Source: SciCrunch Registry

https://plasma.oxinst.com/products/cvd/plasmapro-100-nano

Chemical Vapour Deposition and PECVD tools for growth of 1D and 2D nanomaterials and heterostructures. PlasmaPro 100 Nano delivers performance growth of nanomaterials with in situ catalyst activation and process control, with flexible temperatures up to 1,200 degrees C.

Proper citation: Oxford PlasmaPro 100 Nano Plasma Technology (RRID:SCR_020384) Copy   

•   Source: SciCrunch Registry

https://plasma.oxinst.com/products/rie/80rie

PlasmaPro 80 reactive ion etch is compact, small footprint system offering etch and deposition solutions with open loading. Open load design allows fast wafer loading and unloading, ideal for research, prototyping and low volume production. It enables high performance processes using optimised electrode cooling and substrate temperature control.

Proper citation: Oxford PlasmaPro 80 RIE Plasma Technology (RRID:SCR_020381) Copy   

•   Source: SciCrunch Registry

https://nanoscience.oxinst.com/products/cryofree-magnets/spectromagpt

Split pair, horizontal field magneto optical Cryofree superconducting magnet system. It provides optical access to sample in variable magnetic field and low temperature environment.

Proper citation: Oxford SpectromagPT Superconducting Magnet System (RRID:SCR_020382) Copy   

•   Source: SciCrunch Registry

https://plasma.oxinst.com/products/pecvd/plasmapro-80-pecvd

PlasmaPro 80 is compact, small footprint system offering etch and deposition solutions with open loading. Open load design allows fast wafer loading and unloading, ideal for research, prototyping and low volume production. It enables high performance processes using optimised electrode cooling and substrate temperature control.

Proper citation: Oxford PlasmaPro 80 PECVD Plasma Technology (RRID:SCR_020380) Copy   

•   Source: SciCrunch Registry

https://plasma.oxinst.com/products/icpcvd/plasmapro-80-icpcvd

PlasmaPro 80 is compact, small footprint system offering etch and deposition solutions with open loading. Open load design allows fast wafer loading and unloading, ideal for research, prototyping and low volume production. It enables high performance processes using optimised electrode cooling and substrate temperature control.

Proper citation: Oxford PlasmaPro 80 ICPCVD Plasma Technology (RRID:SCR_020378) Copy   

•   Source: SciCrunch Registry

https://plasma.oxinst.com/products/rie/plasmapro-100

PlasmaPro 100 RIE modules deliver anisotropic dry etching. Being compatible with all wafer sizes up to 200mm, it has rapid change between wafer size, uniformity, high throughput and high precision processes, in situ chamber cleaning and end pointing, and wide temperature range electrode, from 150 degrees C to 400 degrees C.

Proper citation: Oxford PlasmaPro 100 RIE Plasma Technology (RRID:SCR_020376) Copy   

•   Source: SciCrunch Registry

https://plasma.oxinst.com/products/icp-etching/80icp

PlasmaPro 80 ICP is compact, small footprint system offering ICP etch solutions with open loading. Open load design allows fast wafer loading and unloading, ideal for research, prototyping and low volume production. It enables high performance processes using optimised electrode cooling and substrate temperature control.

Proper citation: Oxford PlasmaPro 80 ICP Plasma Technology (RRID:SCR_020377) Copy   

•   Source: SciCrunch Registry

https://plasma.oxinst.com/products/ald/flexal

FlexAL systems provide newrange of flexibility and capability in engineering of nanoscale structures and devices by offering remote plasma atomic layer deposition processes and thermal ALD within single ALD systems.

Proper citation: Oxford FlexAL ALD System Plasma Technology (RRID:SCR_020352) Copy   

•   Source: SciCrunch Registry

https://plasma.oxinst.com/products/atomic-layer-deposition/atomfab

Uses remote source specifically designed for atomic scale processing. Has low damage for sensitive substrates, fast cycle times and reliablity with uniform plasma exposure and film deposition, short plasma times, 250ms, short strike time, 80ms, for high throughput, and reproducible strike time and low reflected power for high yield.

Proper citation: Oxford Atomfab ALD Plasma Technology (RRID:SCR_020350) Copy   

•   Source: SciCrunch Registry

https://nanoscience.oxinst.com/products/control-electronics/mercuryips

Magnet power supply system enables automated control of wide range of superconducting magnets, including NMR, high field, beamline and Vector Rotate magnet systems. MercuryiPS is bi polar and has high stability, four quadrant power supply with incorporated quench protection.

Proper citation: Oxford MercuryiPS Power Supply System (RRID:SCR_020361) Copy   

•   Source: SciCrunch Registry

https://plasma.oxinst.com/products/ald/flexal#product-information-tabs

Ion beam deposition products produce deposited films with high quality, dense and smooth surfaces. Ion beam technology provides approach to etch and deposition by offering single tool and maximising system utilisation, which includes open load, single substrate load lock, and cassette to cassette.

Proper citation: Oxford Ionfab 300 IBD Plasma Technology (RRID:SCR_020362) Copy   

•   Source: SciCrunch Registry